We perform a systematic study of the effect of adjacent nanostructures on the confinement of block copolymers (BCP) within pre-patterned trenches in 100 nm thick SiO2 films. Asymmetric PS-b-PMMA BCP with a styrene fraction of 0.71
Collective behavior of block copolymer thin films within periodic topographical structures
Perego M;Seguini;
2013
Abstract
We perform a systematic study of the effect of adjacent nanostructures on the confinement of block copolymers (BCP) within pre-patterned trenches in 100 nm thick SiO2 films. Asymmetric PS-b-PMMA BCP with a styrene fraction of 0.71File in questo prodotto:
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