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We perform a systematic study of the effect of adjacent nanostructures on the confinement of block copolymers (BCP) within pre-patterned trenches in 100 nm thick SiO2 films. Asymmetric PS-b-PMMA BCP with a styrene fraction of 0.71

Collective behavior of block copolymer thin films within periodic topographical structures

Perego M;Seguini;
2013

Abstract

We perform a systematic study of the effect of adjacent nanostructures on the confinement of block copolymers (BCP) within pre-patterned trenches in 100 nm thick SiO2 films. Asymmetric PS-b-PMMA BCP with a styrene fraction of 0.71
2013
Istituto per la Microelettronica e Microsistemi - IMM
24
24
2-s2.0-84878291821
http://www.scopus.com/inward/record.url?eid=2-s2.0-84878291821&partnerID=40&md5=2fccc0492b2ae6915f10cc09d0261c6f
cited By (since 1996)1
6
info:eu-repo/semantics/article
262
Perego, M; Andreozzi, A; Vellei, A; Ferrarese Lupi, F; Seguini, Gabriele; G,
01 Contributo su Rivista::01.01 Articolo in rivista
none
01.01 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/218141
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