Fe3-?O4/MgO/Co magnetic tunnel junctions (MTJs) are synthesized on top of ~1 inch Si/SiO2 substrates by conducting a full in situ chemical vapour and atomic layer deposition process with no vacuum break. Tunnel magnetoresistance up to 6% is measured at room temperature, increasing to 12.5% at 120 K. Our results demonstrate the possibility of using full-chemical processes to synthesize functional MTJs, and this could provide a path towards the use of cost-effective methods to produce magnetic devices on a large scale.

Fe3-?O4/MgO/Co magnetic tunnel junctions synthesized by full in situ atomic layer and chemical vapour deposition

Mantovan Roberto;Lamperti Alessio;Manca Nicola;Pellegrino Luca;Fanciulli Marco
2014

Abstract

Fe3-?O4/MgO/Co magnetic tunnel junctions (MTJs) are synthesized on top of ~1 inch Si/SiO2 substrates by conducting a full in situ chemical vapour and atomic layer deposition process with no vacuum break. Tunnel magnetoresistance up to 6% is measured at room temperature, increasing to 12.5% at 120 K. Our results demonstrate the possibility of using full-chemical processes to synthesize functional MTJs, and this could provide a path towards the use of cost-effective methods to produce magnetic devices on a large scale.
2014
Istituto per la Microelettronica e Microsistemi - IMM
Istituto Superconduttori, materiali innovativi e dispositivi - SPIN
atomic layer deposition
chemical vapour deposition
magnetic tunnel junctions
magnetite
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/226618
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