Abstract-The effect of a complete fabrication cycloe f a single photon avalanche diode (SPAD) on denuded zone presence and width is reported. The heavy diffusion stage required to create a deep guard ring junction appears to be the most deleterious for the denuded zone stability and the final bulk defect content. The out-diffusion step parameters are decisive in assuring the denuded zone stability: theu se of a chlorinated oxidizing ambient during the out-diffusion treatment appears to be sufficient to maintain a satisfactory denuded zone widthe ven after the heavy-diffusion stagTeh. e role of process-induced defects, in particular of the interstitials, is stressed out.

DENUDED ZONE STABILITY IN A SPAD DIODE AS A FUNCTION OF OUT-DIFFUSION PARAMETERS

1987

Abstract

Abstract-The effect of a complete fabrication cycloe f a single photon avalanche diode (SPAD) on denuded zone presence and width is reported. The heavy diffusion stage required to create a deep guard ring junction appears to be the most deleterious for the denuded zone stability and the final bulk defect content. The out-diffusion step parameters are decisive in assuring the denuded zone stability: theu se of a chlorinated oxidizing ambient during the out-diffusion treatment appears to be sufficient to maintain a satisfactory denuded zone widthe ven after the heavy-diffusion stagTeh. e role of process-induced defects, in particular of the interstitials, is stressed out.
1987
Istituto per la Microelettronica e Microsistemi - IMM
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/237129
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