ABSTRACT Amorphous silicon carbide films have been deposited by PECVD in SiH4+CH4+H2 mixtures at different hydrogen dilutions. The optoelecuonic properties of the films have been measured by transmittance-reflectance spectroscopy, photothermal deflection spectroscopy and photo and dark electrical conductivity. Structural properties have been obtained by FTIR spectroscopy. It was found that high hydrogen dilution leads to materials of improved quality, p-i-n device structures have been deposited with intrinsic layers at different hydrogen dilution levels.
Optimization of Optoelectronic Properties of a-SiC:H Films
Rizzoli;Summonte;
1993
Abstract
ABSTRACT Amorphous silicon carbide films have been deposited by PECVD in SiH4+CH4+H2 mixtures at different hydrogen dilutions. The optoelecuonic properties of the films have been measured by transmittance-reflectance spectroscopy, photothermal deflection spectroscopy and photo and dark electrical conductivity. Structural properties have been obtained by FTIR spectroscopy. It was found that high hydrogen dilution leads to materials of improved quality, p-i-n device structures have been deposited with intrinsic layers at different hydrogen dilution levels.File in questo prodotto:
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