Y2O3 thin films were synthesized by Chemical Vapor Deposition (CVD) using Y(acac)3.xH2O (Hacac= 2,4-pentanedione) as precursor. This work is focused on the X-ray Photoelectron Spectroscopy (XPS) characterization of an Y2O3 thin film deposited on glass substrate at 450°C in N2+O2 atmosphere and subsequently annealed in air at 1000°C. Besides the wide scan spectrum, charge corrected binding energies for the Y3d5/2, Y3d3/2, O1s and C1s surface photoelectron signals are reported.

Y2O3 thin films characterized by XPS

GERBASI, ROSALBA;BARRECA, DAVIDE
2001

Abstract

Y2O3 thin films were synthesized by Chemical Vapor Deposition (CVD) using Y(acac)3.xH2O (Hacac= 2,4-pentanedione) as precursor. This work is focused on the X-ray Photoelectron Spectroscopy (XPS) characterization of an Y2O3 thin film deposited on glass substrate at 450°C in N2+O2 atmosphere and subsequently annealed in air at 1000°C. Besides the wide scan spectrum, charge corrected binding energies for the Y3d5/2, Y3d3/2, O1s and C1s surface photoelectron signals are reported.
2001
CHIMICA INORGANICA E DELLE SUPERFICI
Istituto di Chimica della Materia Condensata e di Tecnologie per l'Energia - ICMATE
8
234
239
6
Sì, ma tipo non specificato
thin films; x-ray photoelectron spectroscopy; yttrium(III) oxide
2
info:eu-repo/semantics/article
262
Gerbasi, Rosalba; Barreca, Davide
01 Contributo su Rivista::01.01 Articolo in rivista
none
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/25004
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