In the present study, x-ray photoelectron spectroscopy (XPS) was employed to investigate the principal core levels of a Fe2O3 thin film. The sample was deposited on glass in a N2 + O2 atmosphere by chemical vapor deposition (CVD), using Fe(acac)3 (Hacac = 2,4-pentanedione) as the source compound. XPS surface data for the Fe 2p3/2, O1s, and C 1s photoelectrons, obtained by an Al Ka monochromatized excitation source, are reported. Deconvolution of the O 1s signal revealed the presence of -OH groups along with the major component ascribed to lattice oxygen. The relatively high carbon content in the film indicated an incomplete decomposition of the used precursor.
Chemical vapor deposited Fe2O3 thin films analyzed by XPS
GERBASI, ROSALBA;BARRECA, DAVIDE
2001
Abstract
In the present study, x-ray photoelectron spectroscopy (XPS) was employed to investigate the principal core levels of a Fe2O3 thin film. The sample was deposited on glass in a N2 + O2 atmosphere by chemical vapor deposition (CVD), using Fe(acac)3 (Hacac = 2,4-pentanedione) as the source compound. XPS surface data for the Fe 2p3/2, O1s, and C 1s photoelectrons, obtained by an Al Ka monochromatized excitation source, are reported. Deconvolution of the O 1s signal revealed the presence of -OH groups along with the major component ascribed to lattice oxygen. The relatively high carbon content in the film indicated an incomplete decomposition of the used precursor.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
