... Here we report preliminary results on the deposition of magnesium titanium oxide thin films grown on fused quartz and Si (001) substrates via metalorganic chemical vapor deposition (MOCVD) by using two highly volatile liquid precursors, namely titanium tetra-isopropoxide [Ti(OiPr)4] and bis-methylcyclopentadienyl magnesium [Mg(Me-Cp)2].
MOCVD of magnesium titanium oxide thin films using an unusual magnesium precursor
G Carta;R Gerbasi;G Rossetto;M Natali;
2007
Abstract
... Here we report preliminary results on the deposition of magnesium titanium oxide thin films grown on fused quartz and Si (001) substrates via metalorganic chemical vapor deposition (MOCVD) by using two highly volatile liquid precursors, namely titanium tetra-isopropoxide [Ti(OiPr)4] and bis-methylcyclopentadienyl magnesium [Mg(Me-Cp)2].File in questo prodotto:
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