Electron cyclotron resonance (ECR) ion sources are largely used for production of intense beams in science and industry. Performances of modern devices are severely limited by the generation of suprathermal electrons, whose origin is still controversial. We hereby demonstrate that the electron energy distribution function is strongly influenced by the reciprocal displacement of magnetic field and plasma density profiles. The latter can be modified independently of the former, e.g. by changing the plasma anisotropic diffusion. Auxiliary electrons emitted by carbon nanotube based electron guns are used for Simon current compensation: this significantly reduces the ion losses, increases the output currents and successfully suppresses the hot electron generation.

An Investigation on suprathermal electrons formation in a B-min ECR machine and a novel method for their damping

R Rizzoli;
2013

Abstract

Electron cyclotron resonance (ECR) ion sources are largely used for production of intense beams in science and industry. Performances of modern devices are severely limited by the generation of suprathermal electrons, whose origin is still controversial. We hereby demonstrate that the electron energy distribution function is strongly influenced by the reciprocal displacement of magnetic field and plasma density profiles. The latter can be modified independently of the former, e.g. by changing the plasma anisotropic diffusion. Auxiliary electrons emitted by carbon nanotube based electron guns are used for Simon current compensation: this significantly reduces the ion losses, increases the output currents and successfully suppresses the hot electron generation.
2013
Istituto per la Microelettronica e Microsistemi - IMM
ECR ion sources
carbon nanotubes
electron field emission sources
damping of electrons in a plasma
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/255302
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