Nanocrystalline diamond (NCD) films with and without a diamond buffer layer (BL) have been grown on p-type silicon substrates by microwave plasma enhanced chemical vapor deposition technique at different values of deposition temperature (652-884°C). The photo- and thermionic electron emission properties of NCD films have been investigated, illustrated and explained by analyzing the surface morphology and the grain shape determined by atomic force microscopy, the chemical-structural properties by Raman spectroscopy and nanocrystallites size by X-ray diffraction. The NCD films with BL grown at the highest deposition temperature have shown the highest photo- and thermionic emission currents.
Photo- and thermionic emission of MWPECVD nanocrystalline diamond films
G Cicala;A Bellucci;DM Trucchi
2014
Abstract
Nanocrystalline diamond (NCD) films with and without a diamond buffer layer (BL) have been grown on p-type silicon substrates by microwave plasma enhanced chemical vapor deposition technique at different values of deposition temperature (652-884°C). The photo- and thermionic electron emission properties of NCD films have been investigated, illustrated and explained by analyzing the surface morphology and the grain shape determined by atomic force microscopy, the chemical-structural properties by Raman spectroscopy and nanocrystallites size by X-ray diffraction. The NCD films with BL grown at the highest deposition temperature have shown the highest photo- and thermionic emission currents.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
