A global minimum search weighted and non-weighted least squares algorithm has been employed for a comparative study of various possible models to describe electrical properties of high dose Al implanted 4H-SiC. A wide range of experimental data has been taken from the literature to validate the model. It was found that a single activation energy level, a temperature dependent Hall scattering factor and a degeneracy factor equal to 4 lead to a satisfactory fitting of experimental Hall data up to an Al substitutional density of 10(20) cm(-3) in 4H-SiC.

Simulation of the Temperature Dependence of Hall Carriers in Al Doped 4H-SiC

Nipoti R
2012

Abstract

A global minimum search weighted and non-weighted least squares algorithm has been employed for a comparative study of various possible models to describe electrical properties of high dose Al implanted 4H-SiC. A wide range of experimental data has been taken from the literature to validate the model. It was found that a single activation energy level, a temperature dependent Hall scattering factor and a degeneracy factor equal to 4 lead to a satisfactory fitting of experimental Hall data up to an Al substitutional density of 10(20) cm(-3) in 4H-SiC.
2012
Istituto per la Microelettronica e Microsistemi - IMM
978-3-03785-419-8
acceptor doping
dopant ionization energy
simulation
neutrality equation
Hall carriers temperature dependence
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/274879
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