In this work an advanced overview in the field of near-infrared silicon photodetectors, is presented. Proposed photodetectors are based on the internal photoemission effect through a Schottky junction and their fabrication results completely compatible with the silicon technology. Taking advantage of both new structures and new two-dimensional emerging materials, a progressive increase in device performance has been demonstrated along the last years. Our insights show that silicon devices based on the internal photoemission effect are already suitable for power monitoring applications and they could play a key role in the telecommunications opening new frontiers in the field of low-cost silicon photonics. © 2014 AEIT.

NIR silicon Schottky photodetector: From metal to graphene

Casalino Maurizio;Coppola Giuseppe;Sirleto Luigi;Iodice Mario;Gioffrè Mariano A;Rendina Ivo;
2014

Abstract

In this work an advanced overview in the field of near-infrared silicon photodetectors, is presented. Proposed photodetectors are based on the internal photoemission effect through a Schottky junction and their fabrication results completely compatible with the silicon technology. Taking advantage of both new structures and new two-dimensional emerging materials, a progressive increase in device performance has been demonstrated along the last years. Our insights show that silicon devices based on the internal photoemission effect are already suitable for power monitoring applications and they could play a key role in the telecommunications opening new frontiers in the field of low-cost silicon photonics. © 2014 AEIT.
2014
Istituto per la Microelettronica e Microsistemi - IMM
9788887237177
Fabry-Perot
Internal photoemission effect
Near-infrared
Photodetector
Silicon
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/285910
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