The phase behaviour in thin films of an asymmetric polystyrene-b-polymethylmethacrylate (PS-b-PMMA) block copolymer with a molecular weight of 39 kg mol 1 was assessed at a wide range of temperatures and times. Cylindrical PMMA structures featuring a diameter close to 10 nm and perpendicularly oriented with respect to the substrate were obtained at 180 degrees C in relatively short annealing times (t <= 30 min) by means of a simple thermal treatment performed in a standard rapid thermal processing machine.

Thermally induced self-assembly of cylindrical nanodomains in low molecular weight PS-b-PMMA thin films

Seguini Gabriele;Giammaria Tommaso J;Ferrarese Lupi Federico;Perego Michele
2014

Abstract

The phase behaviour in thin films of an asymmetric polystyrene-b-polymethylmethacrylate (PS-b-PMMA) block copolymer with a molecular weight of 39 kg mol 1 was assessed at a wide range of temperatures and times. Cylindrical PMMA structures featuring a diameter close to 10 nm and perpendicularly oriented with respect to the substrate were obtained at 180 degrees C in relatively short annealing times (t <= 30 min) by means of a simple thermal treatment performed in a standard rapid thermal processing machine.
2014
Istituto per la Microelettronica e Microsistemi - IMM
PS-b-PMMA
block copolymer
rapid thermal processing (RTP)
self-assembling
nanolithography
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/286345
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