Diamond is one of the suitable semi-conductor for vacuum electronics replacement in high power and high frequency applications. Sub-micron gate-length (200 nm) Metal Semiconductor Field Effect Transistor (MESFETs) have been fabricated on h-terminated polycrystalline diamond and characterized in order to investigate the possibility of RFICs integration. High power (P =1.5 W/mm) and high frequency (and f=35 GHz) performances have been obtained. © 2009 IEEE.

K-band diamond MESFETs for RFIC technology

Giovine E;
2009

Abstract

Diamond is one of the suitable semi-conductor for vacuum electronics replacement in high power and high frequency applications. Sub-micron gate-length (200 nm) Metal Semiconductor Field Effect Transistor (MESFETs) have been fabricated on h-terminated polycrystalline diamond and characterized in order to investigate the possibility of RFICs integration. High power (P =1.5 W/mm) and high frequency (and f=35 GHz) performances have been obtained. © 2009 IEEE.
2009
Istituto di fotonica e nanotecnologie - IFN
9781424433780
Diamond
Microwave operation
RF performances
RFICS
Wide band gap semiconductors
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/362171
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