In this work we focus on P doping of Si nanocrystals (NCs) embedded in a SiO2 matrix. We prove that, at equilibrium, high P concentrations within the Si NCs are thermodynamically favoured. We experimentally estimate the energy barriers for P diffusion in SiO2 and trapping/de-trapping at the SiO2/Si NCs interface, obtaining a complete picture of the system at equilibrium.

Thermodynamic stability of high phosphorus concentration in silicon nanostructures

Perego Michele;Seguini Gabriele;Nicotra Giuseppe;Scuderi Mario;Napolitani Enrico
2015

Abstract

In this work we focus on P doping of Si nanocrystals (NCs) embedded in a SiO2 matrix. We prove that, at equilibrium, high P concentrations within the Si NCs are thermodynamically favoured. We experimentally estimate the energy barriers for P diffusion in SiO2 and trapping/de-trapping at the SiO2/Si NCs interface, obtaining a complete picture of the system at equilibrium.
2015
Istituto per la Microelettronica e Microsistemi - IMM
doping
silicon
nanostructures
diffusion
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/405432
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