The design and realization of a simple and reliable convertible diode/magnetron deposition system allowing the in situ production of both high-T-c superconducting oxide films and low-T-c superconducting metallic films is presented. The ability to produce high-quality double-sided in situ films with uniform characteristics over 2 " diameter targets is demonstrated. This apparatus can represent a valid alternative to more sophisticated, less flexible deposition systems and is well suited for application in the large-scale production of superconducting filters for wireless communications.

A simple and reliable system for in situ deposition of large-area double-sided, superconducting films

POrgiani;MSalluzzo;
2000

Abstract

The design and realization of a simple and reliable convertible diode/magnetron deposition system allowing the in situ production of both high-T-c superconducting oxide films and low-T-c superconducting metallic films is presented. The ability to produce high-quality double-sided in situ films with uniform characteristics over 2 " diameter targets is demonstrated. This apparatus can represent a valid alternative to more sophisticated, less flexible deposition systems and is well suited for application in the large-scale production of superconducting filters for wireless communications.
2000
INFM
THIN-FILMS
WAFERS
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/416
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