Forward J-V curves of 4H-SiC p-i-n diodes are analyzed by means of an analytical model in order to justify the presence of a crossing-point. The interlacing behaviour occurring in the J-V curves of 4H-SiC diodes at different temperatures is predicted by a simple formula, which can be used for a first-order design of such devices. Numerical simulation of diodes designed with different epilayer thickness and carrier lifetime values have been used in order to analyze the crossing-point behaviour. Comparisons with experimental data confirm the analytic and simulated results.

Analytical prediction of the cross-over point in the temperature coefficient of the forward characteristics of 4H-SiC p+-i-n diodes

Nipoti R
2015

Abstract

Forward J-V curves of 4H-SiC p-i-n diodes are analyzed by means of an analytical model in order to justify the presence of a crossing-point. The interlacing behaviour occurring in the J-V curves of 4H-SiC diodes at different temperatures is predicted by a simple formula, which can be used for a first-order design of such devices. Numerical simulation of diodes designed with different epilayer thickness and carrier lifetime values have been used in order to analyze the crossing-point behaviour. Comparisons with experimental data confirm the analytic and simulated results.
2015
Istituto per la Microelettronica e Microsistemi - IMM
9783038354789
4H-polytype of silicon carbide (4H-SiC)
Diodes
Ion implantation
Semiconductor device modelling
Thermal stability
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/428043
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