We report the integration of high-quality epitaxial La2/3Sr1/3MnO3 (LSMO) thin films onto SrTiO3 buffered Silicon-on-Sapphire (SOS) substrates by combining state-of-the-art thin film growth techniques such as molecular beam epitaxy and pulsed laser deposition. Detailed structural, magnetic and electrical characterizations of the LSMO/STO/SOS heterostructures show that the LSMO film properties are competitive with those directly grown on oxide substrates. X-ray magnetic circular dichroism measurements on Mn L2,3 edges show strong dichroic signal at room temperature, and angular-dependent in-plane magnetic properties by magneto-optical Kerr magnetometry reveal isotropic magnetic anisotropy. Suspended micro-bridges were thus finally fabricated by silicon micromachining, thus demonstrating the potential use of integrating LSMO magnetic layer on industrially compatible SOS substrates for the development of applicative MEMS devices.
Integration of epitaxial La2/3Sr1/3MnO3 thin films on silicon-on-sapphire substrate for MEMS applications
Sandeep Kumar Chaluvadi;Pasquale Orgiani;Vincent Polewczyk;Giovanni Vinai;
2022
Abstract
We report the integration of high-quality epitaxial La2/3Sr1/3MnO3 (LSMO) thin films onto SrTiO3 buffered Silicon-on-Sapphire (SOS) substrates by combining state-of-the-art thin film growth techniques such as molecular beam epitaxy and pulsed laser deposition. Detailed structural, magnetic and electrical characterizations of the LSMO/STO/SOS heterostructures show that the LSMO film properties are competitive with those directly grown on oxide substrates. X-ray magnetic circular dichroism measurements on Mn L2,3 edges show strong dichroic signal at room temperature, and angular-dependent in-plane magnetic properties by magneto-optical Kerr magnetometry reveal isotropic magnetic anisotropy. Suspended micro-bridges were thus finally fabricated by silicon micromachining, thus demonstrating the potential use of integrating LSMO magnetic layer on industrially compatible SOS substrates for the development of applicative MEMS devices.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.