Modifications of nanocrystalline RuO2 and Ru films, chemical-vapor deposited on Ti substrates, are studied inaqueous media, at the initial stages of electrocatalytic O2 evolution. The microstructure, composition andmorphology of the films are examined ex situ by X-ray diffraction (XRD), X-ray photoelectron spectroscopy(XPS), secondary ion mass spectrometry (SIMS) and atomic force microscopy (AFM). Results concerning theinfluence of electrochemical processing on the chemico-physical properties and electrode behavior are presentedand discussed.
Influence of electrochemical processing on the composition and microstructure of chemical-vapor deposited Ru and RuO2 nanocrystalline films
S Barison;D Barreca;S Daolio;M Fabrizio
;
2002
Abstract
Modifications of nanocrystalline RuO2 and Ru films, chemical-vapor deposited on Ti substrates, are studied inaqueous media, at the initial stages of electrocatalytic O2 evolution. The microstructure, composition andmorphology of the films are examined ex situ by X-ray diffraction (XRD), X-ray photoelectron spectroscopy(XPS), secondary ion mass spectrometry (SIMS) and atomic force microscopy (AFM). Results concerning theinfluence of electrochemical processing on the chemico-physical properties and electrode behavior are presentedand discussed.File in questo prodotto:
File | Dimensione | Formato | |
---|---|---|---|
prod_21482-doc_49252.pdf
solo utenti autorizzati
Descrizione: paper
Licenza:
NON PUBBLICO - Accesso privato/ristretto
Dimensione
684.23 kB
Formato
Adobe PDF
|
684.23 kB | Adobe PDF | Visualizza/Apri Richiedi una copia |
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.