Recently, much attention has been focused on cobalt oxide-based materials. In this study, Co3O4, CoO and CoO-SiO2 coatings were synthesized via sol-gel using cobalt acetate [Co(CH3COO)2.4H2O] and tetraethoxysilane [Si(OC2H5)4] (TEOS) as starting compounds. The precursor choice was made taking into account that acetate decomposes under thermal treatment without leaving residual contaminants inside the coatings. The films were prepared by a dip-coating procedure from alcoholic solutions of the proper precursors and subsequently annealed in different conditions. Co3O4 coatings were obtained after heating in air or nitrogen at 300°C. Treatments in reducing atmosphere (H2/Ar) yielded CoO layers up to 500°C, and films of metallic cobalt for firing at higher temperatures. CoO-SiO2 coatings were heated in air between 300 and 900°C. CoO cluster formation in the silica glass layer is not yet well clarified. The chemical composition and the microstructural evolution of the coatings were studied by X-ray photoelectron spectroscopy (XPS), secondary-ion mass spectrometry (SIMS), UV-Vis spectroscopy and X-ray diffraction (XRD).
Cobalt oxide-based films: sol-gel synthesis and characterization
L Armelao;D Barreca;S Gross;
2001
Abstract
Recently, much attention has been focused on cobalt oxide-based materials. In this study, Co3O4, CoO and CoO-SiO2 coatings were synthesized via sol-gel using cobalt acetate [Co(CH3COO)2.4H2O] and tetraethoxysilane [Si(OC2H5)4] (TEOS) as starting compounds. The precursor choice was made taking into account that acetate decomposes under thermal treatment without leaving residual contaminants inside the coatings. The films were prepared by a dip-coating procedure from alcoholic solutions of the proper precursors and subsequently annealed in different conditions. Co3O4 coatings were obtained after heating in air or nitrogen at 300°C. Treatments in reducing atmosphere (H2/Ar) yielded CoO layers up to 500°C, and films of metallic cobalt for firing at higher temperatures. CoO-SiO2 coatings were heated in air between 300 and 900°C. CoO cluster formation in the silica glass layer is not yet well clarified. The chemical composition and the microstructural evolution of the coatings were studied by X-ray photoelectron spectroscopy (XPS), secondary-ion mass spectrometry (SIMS), UV-Vis spectroscopy and X-ray diffraction (XRD).I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
