C2F4 and c-C4F8 fed plasmas have been investigated for the deposition of fluorocarbon coatings. While continuous glow discharges lead to flat films with a moderate fluorine content, modulated plasmas allows for the deposition of highly fluorinated coatings with a varaiable morphology. It is shown that, particularly in the case of tetrafluorethylene, a unique chemical and morphological structure can be obtained and it can be explained with a modified activated growth model mechanism.
Plasma-surface interactions in the plasma deposition mechanism of structured Teflon-like coatings
Palumbo Fabio;Cicala Grazia;
2003
Abstract
C2F4 and c-C4F8 fed plasmas have been investigated for the deposition of fluorocarbon coatings. While continuous glow discharges lead to flat films with a moderate fluorine content, modulated plasmas allows for the deposition of highly fluorinated coatings with a varaiable morphology. It is shown that, particularly in the case of tetrafluorethylene, a unique chemical and morphological structure can be obtained and it can be explained with a modified activated growth model mechanism.File in questo prodotto:
Non ci sono file associati a questo prodotto.
I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
