The deposition of metallic platinum thin films via MOCVD (Metal Organic Chemical Vapor Deposition) finds considerable interest for its practical applications in a wide range of technologies including microelectronics, electrochemistry and catalysis 1. In this work depositions of platinum thin films were carried out on quartz and CaF2 substrates for their potential application as electrode surfaces using, as precursor, the commercial compound platinum(II) acetylacetonate (Pt(acac)2) and analyzed by XRD (X-ray Diffraction), XPS (X-ray Photoelectron Spectroscopy), SIMS (Second Ion Mass Spectroscopy), AFM (Atomic Force Microscopy).
Spectroscopic characterization of platinum thin films obtained via MOCVD on quartz and CaF2 substrates
S Barison;M Fabrizio;D Barreca;G Carta;G Rossetto;P Zanella
2000
Abstract
The deposition of metallic platinum thin films via MOCVD (Metal Organic Chemical Vapor Deposition) finds considerable interest for its practical applications in a wide range of technologies including microelectronics, electrochemistry and catalysis 1. In this work depositions of platinum thin films were carried out on quartz and CaF2 substrates for their potential application as electrode surfaces using, as precursor, the commercial compound platinum(II) acetylacetonate (Pt(acac)2) and analyzed by XRD (X-ray Diffraction), XPS (X-ray Photoelectron Spectroscopy), SIMS (Second Ion Mass Spectroscopy), AFM (Atomic Force Microscopy).File in questo prodotto:
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