Local current transport across graphene/4H-SiC was studied with nanometric scale lateral resolution by Scanning Current Spectroscopy on both graphene grown epitaxially on 4H-SiC(0001) (EG-SiC) and graphene exfoliated from highly oriented pyrolitic graphite and deposited on 4H-SiC(0001) (DG-SiC). The study revealed that the Schottky banier height (SBH) of EG/4H-SiC(0001) is lowered by ~0.49eV. This is explained in terms of Fermi-level pinning above the Dirac point in EG due to the presence of positively charged states at the interface between Si face of 4H-SiC and carbon-rich buffer layer. Furthermore, Scanning Capacitance Spectroscopy based method allowed evaluating local electron mean free path (l gr) in graphene. l gr in EG-SiC was observed to be, on average, ~0.4 times that in DG-SiC and exhibited large point-to-point variations due to presence of laterally homogeneous positively charged buffer layer at the interface. However, l gr in graphene on SiC was observed to be larger than on standard SiO 2 samples (DG-SiO 2), which is explained by better dielectric screening of charged impurities and lower surface polar phonon scattering at the graphene/substrate interface. (c) (2011) Trans Tech Publications.

Local electrical properties of the 4H-SiC(0001)/graphene interface

Giannazzo;Rimini;Raineri;
2011

Abstract

Local current transport across graphene/4H-SiC was studied with nanometric scale lateral resolution by Scanning Current Spectroscopy on both graphene grown epitaxially on 4H-SiC(0001) (EG-SiC) and graphene exfoliated from highly oriented pyrolitic graphite and deposited on 4H-SiC(0001) (DG-SiC). The study revealed that the Schottky banier height (SBH) of EG/4H-SiC(0001) is lowered by ~0.49eV. This is explained in terms of Fermi-level pinning above the Dirac point in EG due to the presence of positively charged states at the interface between Si face of 4H-SiC and carbon-rich buffer layer. Furthermore, Scanning Capacitance Spectroscopy based method allowed evaluating local electron mean free path (l gr) in graphene. l gr in EG-SiC was observed to be, on average, ~0.4 times that in DG-SiC and exhibited large point-to-point variations due to presence of laterally homogeneous positively charged buffer layer at the interface. However, l gr in graphene on SiC was observed to be larger than on standard SiO 2 samples (DG-SiO 2), which is explained by better dielectric screening of charged impurities and lower surface polar phonon scattering at the graphene/substrate interface. (c) (2011) Trans Tech Publications.
2011
Istituto per la Microelettronica e Microsistemi - IMM
Carbon rich
Charged impurity
Current transport
Dielectric screening
Dirac point
Electrical property
Electron mean free path
Fermi level pinning
Highly oriented pyrolitic graphites
Lateral resolution
Local electron mean free path
Nanometric scale
Positively charged
Scanning capacitance spectroscopy
Schottky
Buffer layers
Capacitance
Capacitance measurement
Graphene
Scanning
Semiconductor metal boundaries
Silicon carbide
Silicon oxides
Semiconducting silicon compounds
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/247206
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