In this work, the temperature dependence of the mobility along the c axis in 4H-SiC was determined from the current voltage (I-V) characteristics of Schottky diodes in the temperature range 80-700 K. The procedure used series resistance measurements in Schottky diodes for extracting the mobility values in the epitaxial layer. For a dopant concentration of 1.2x10(16) cm(-3), at room temperature, a mobility value of 724 cm(2)/(V s) was found, which decreased to 48.6 cm(2)/(V s) at 700 K. In the temperature range 200-700 K, a dependence of the mobility as T-3 was determined.

Drift mobility in 4H-SiC Schottky diodes

La Via F;Roccaforte F;
2005

Abstract

In this work, the temperature dependence of the mobility along the c axis in 4H-SiC was determined from the current voltage (I-V) characteristics of Schottky diodes in the temperature range 80-700 K. The procedure used series resistance measurements in Schottky diodes for extracting the mobility values in the epitaxial layer. For a dopant concentration of 1.2x10(16) cm(-3), at room temperature, a mobility value of 724 cm(2)/(V s) was found, which decreased to 48.6 cm(2)/(V s) at 700 K. In the temperature range 200-700 K, a dependence of the mobility as T-3 was determined.
2005
Istituto per la Microelettronica e Microsistemi - IMM
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/40851
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