One of the main problems affecting the vertical Bridgman growth of CdZnTe crystals is the crystal-crucible contact. In this work, we show that it is possible to avoid this interaction by inserting a stable boron oxide liquid layer between the crucible and the melt. This layer improves the structural properties of the grown crystals, reducing the etch pit density to the 10(3) cm(-3) range. The possible origins for the formation of a stable boron oxide layer are discussed.

Boron oxide fully encapsulated CdZnTe crystals grown by the vertical Bridgman technique

Zappettini A;Zha M;Pavesi M;Zanotti L
2007

Abstract

One of the main problems affecting the vertical Bridgman growth of CdZnTe crystals is the crystal-crucible contact. In this work, we show that it is possible to avoid this interaction by inserting a stable boron oxide liquid layer between the crucible and the melt. This layer improves the structural properties of the grown crystals, reducing the etch pit density to the 10(3) cm(-3) range. The possible origins for the formation of a stable boron oxide layer are discussed.
2007
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
CADMIUM TELLURIDE
SURFACE-TENSION
CONTACT-ANGLE
GROWTH
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/40936
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