This article discusses the results obtained from an extensive comparison set up between nine different European laboratories using different two-dimensional (2D) dopant profiling techniques (SCM, SSRM, KPFM, SEM, and electron holography). This study was done within the framework of a European project (HERCULAS), which is focused on the improvement of 2D-profiling tools. Different structures (staircase calibration samples, bipolar transistor, junctions) were used. By comparing the results for the different techniques, more insight is achieved into their strong and weak points and progress is made for each of these techniques concerning sample preparation, dynamic range, junction delineation, modeling, and quantification. Similar results were achieved for similar techniques. However, when comparing the results achieved with different techniques differences are noted.

Assessing the performance of two-dimensional dopant profiling techniques

Raineri V;Giannazzo F;
2004

Abstract

This article discusses the results obtained from an extensive comparison set up between nine different European laboratories using different two-dimensional (2D) dopant profiling techniques (SCM, SSRM, KPFM, SEM, and electron holography). This study was done within the framework of a European project (HERCULAS), which is focused on the improvement of 2D-profiling tools. Different structures (staircase calibration samples, bipolar transistor, junctions) were used. By comparing the results for the different techniques, more insight is achieved into their strong and weak points and progress is made for each of these techniques concerning sample preparation, dynamic range, junction delineation, modeling, and quantification. Similar results were achieved for similar techniques. However, when comparing the results achieved with different techniques differences are noted.
2004
Istituto per la Microelettronica e Microsistemi - IMM
Inglese
22
385
393
Sì, ma tipo non specificato
Scanning capacitance microscopy
Scanning spreading resistance microscopy
Transmission electron microscopy
semiconductors
This paper contains the results obtained in the framework of the European ITN project "Herculas" on the two dimensional characterization of electrical properties in semiconductors by advanced scanning probe microscopy methods.
27
info:eu-repo/semantics/article
262
Duhayon, N; Eyber, P; Fouchier, M; Clarysee, T; Vandervorst, W; Alvarez, D; Schoemann, S; Ciappa, M; Stangoni, M; Fichtner, W; Formanek, P; Kittler, M...espandi
01 Contributo su Rivista::01.01 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/41628
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