Different praseodymium oxide phases have been obtained by varying oxygen partial pressure during the MOCVD process at 750°C on Si(100). Hexagonal Pr2O3 have been obtained under oxygen deficient conditions, while at oxygen partial pressure higher than 0.7 torr oxidized phases, such as Pr6O11 and/or PrO2, are dominant. Transmission electron microscopy (TEM) and energy filtered transmission electron microscopy (EF-TEM) analyses have been used to characterize structural, compositional and morphological features of praseodymium oxide films.
Structural and compositional investigation of high k praseodymium oxide films deposited by MOCVD
Lo Nigro R;Toro R;Bongiorno C;Raineri V;
2003
Abstract
Different praseodymium oxide phases have been obtained by varying oxygen partial pressure during the MOCVD process at 750°C on Si(100). Hexagonal Pr2O3 have been obtained under oxygen deficient conditions, while at oxygen partial pressure higher than 0.7 torr oxidized phases, such as Pr6O11 and/or PrO2, are dominant. Transmission electron microscopy (TEM) and energy filtered transmission electron microscopy (EF-TEM) analyses have been used to characterize structural, compositional and morphological features of praseodymium oxide films.File in questo prodotto:
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