In this work, we investigated the effects of annealing temperature and metal thickness on the Schottky barrier height in state-of-the-art Ti/4H-SiC rectifiers. By varying these two parameters, a controlled lowering of the Schottky barrier height has been obtained, thus giving the possibility to improve the efficiency of device in terms of power consumption.

Barrier height tuning in Ti/4H-SiC Schottky diodes

Bellocchi, G.
;
Vivona, M.
Secondo
;
Bongiorno, C.;Roccaforte, F.
2021

Abstract

In this work, we investigated the effects of annealing temperature and metal thickness on the Schottky barrier height in state-of-the-art Ti/4H-SiC rectifiers. By varying these two parameters, a controlled lowering of the Schottky barrier height has been obtained, thus giving the possibility to improve the efficiency of device in terms of power consumption.
2021
Istituto per la Microelettronica e Microsistemi - IMM
Diffusion
Power device
Schottky barrier
SiC diode
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/524695
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