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CARTA, GIOVANNI

CARTA, GIOVANNI  

CHIMICA INORGANICA E DELLE SUPERFICI (attivo dal 18/11/1923 al 31/12/2021)  

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Risultati 1 - 20 di 40 (tempo di esecuzione: 0.055 secondi).
Titolo Data di pubblicazione Autore(i) File
MOCVD of Vanadium Oxide Films with a Novel Vanadium(III) Precursor 1-gen-2011 Crociani, L; Carta, G; Natali, M; Rigato, V; Rossetto, G
Chemical composition of magnesium boride films obtained by CVD 1-gen-2008 Crociani, L; Carta, G; Kaciulis, S; Mezzi, A; Rossetto, G; Zanella, P
Chemical vapor deposition of hafnium dioxide thin films from cyclopentadienyl hafnium compounds 1-gen-2008 Carta, G; El Habra, N; Rossetto, G; Crociani, L; Torzo, G; Zanella, P; Casarin, M; Cavinato, G; Pace, G; Kaciulis, S; Mezzi, A
Volatile hafnium(IV) compounds with beta-diketonate and cyclopentadienyl derivatives 1-gen-2008 Morozova, N; Zherikova, Kv; Baidina, I A; Sysoev, S V; Semyannikova, P P; Yakovkina, L V; Smirnova, T P; Gelfond, N V; Igumenov, I K; Carta, G; Rossetto, G
CVD of MgO Thin Films from Bis(methylcyclopentadienyl) magnesium 1-gen-2007 Carta, G; El Habra, N; Crociani, L; Rossetto, G; Zanella, P; Zanella, A; Paolucci, G; Barreca, D; Tondello, E
Growth of hafnium dioxide thin films by MOCVD using a new series of cyclopentadienyl hafnium compounds 1-gen-2007 Carta, G; El Habra, N; Rossetto, G; Torzo, G; Crociani, L; Natali, M; Zanella, P; Cavinato, G; Mattarello, V; Rigato, V; Kaciulis, S; Mezzi, A
MgO and CaO stabilized ZrO2 thin films obtained by Metal Organic Chemical Vapor Deposition 1-gen-2007 EL HABRA, Naida; Carta, Giovanni; Barreca, Davide; Rossetto, GILBERTO LUCIO; Zanella, Pierino
MOCVD of CoAl2O4 Thin Films from {Co[Al(OiC3H7)4]2} as precursor 1-gen-2007 El Habra, N; Crociani, L; Sada, C; Zanella, P; Casarin, M; Rossetto, G; Carta, G; Paolucci, G
MOCVD of magnesium titanium oxide thin films using an unusual magnesium precursor 1-gen-2007 Carta, Giovanni; Gerbasi, Rosalba; Rossetto, GILBERTO LUCIO; Zanella, Pierino; Natali, MARCO STEFANO; Bolzan, Marco; Saoncella, Omar
MOCVD of magnesium titanium oxide thin films using an unusual magnesium precursor 1-gen-2007 Carta, G; Gerbasi, R; Rossetto, G; Natali, M; Bolzan, M; Saoncella, O; Rigato, V
Synthesis and physico-chemical characterization of [Hf(NEt2)2Cl2(DME)] and its use as catalyst for ethylene polymerization 1-gen-2007 Carta, Giovanni; Rossetto, Gilberto; Benetollo, Franco; Zanella, Pierino; G, Gianni Cavinato Cavinato
Innovative second-generation Ba and Sr precursors for chemical vapor deposition of Ba1-xSrxTiO3 thin films 1-gen-2006 Giovanni A. Battiston; Rosalba Gerbasi; Giovanni Carta; Fabio Marchetti; Claudio Pettinari; Agustin Rodriguez; Davide Barreca; Cinzia Maragno; Eugenio Tondello
A comparative study of Cr2O3 thin films obtained by MOCVD using three different precursors 1-gen-2005 Carta, G; Natali, M; Rossetto, G; Zanella, P; Salmaso, G; Restello, S; Rigato, V; Kaciulis, S; Mezzi, A
Chemical, morphological and nano-mechanical characterizations of Al2O3 thin films depositrd by metal organic chemical vapour deposition on AISI 304 stainless steel 1-gen-2005 Natali, M; Carta, G; Rigato, V; Rossetto, G; Salmaso, G; Zanella, P
Electrochemical anticorrosion performance evaluation of Al2O3 coatings deposited by MOCVD on an industrial brass substrate 1-gen-2005 Francesca Guidi; Giuseppe Moretti; Giovanni Carta; Marco Natali; Gilberto Rossetto; Pierino Zanella; Guido Salmaso; Valentino Rigato
MOCVD deposition of CoAl2O4 films 1-gen-2005 Carta, G; Casarin, M; El Habra, N; Natali, M; Rossetto, G; Sada, C; Tondello, E; Zanella, P
Non-cyclopentadienyl zirconium complexes as catalysts for 1-hexene polymerization 1-gen-2005 Baù, D; Carta, G; Crociani, L; Paolucci, ; Raggiotto, F; Rossetto, G; Zanella, P
Novel molecular precursors for the MOCVD of Ba1-xSrxTiO3 thin films 1-gen-2005 Carta, Giovanni; Battiston, Giovanni; Gerbasi, Rosalba; Barreca, Davide
Neutral colouring electrochromic thin films deposited via MOCVD 1-gen-2004 Carta, G; Crociani, L; Natali, M; Rigato, V; Rossetto, G; Salmaso, G; Zanella, P Zotti G
Aminolysis of the Si-Cl bond and ligand exchange reaction betwee silicon amido derivatives and SiCl4: synthetic applications and kinetic investigations 1-gen-2003 Passarelli, V; Carta, G; Rossetto, G; Zanella, P