We have investigated 3C-SiC layers grown on silicon and on poly-Si in order to realize test MEMS structures. The residual strain of the films was investigated by the fabrication of cantilevers, beams, springs and we successfully fabricated a Double-Ended-Tuning-Fork double clamped SiC resonator on the film, with perfectly aligned actuation electrode.

Epitaxial growth, mechanical and electrical properties of SiC/Si and SiC/poly-Si

Bosi M;Attolini G;Watts BE;Roncaglia A;Poggi A;Mancarella F;Moscatelli F;Belsito L;Ferri M
2012

Abstract

We have investigated 3C-SiC layers grown on silicon and on poly-Si in order to realize test MEMS structures. The residual strain of the films was investigated by the fabrication of cantilevers, beams, springs and we successfully fabricated a Double-Ended-Tuning-Fork double clamped SiC resonator on the film, with perfectly aligned actuation electrode.
2012
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Istituto per la Microelettronica e Microsistemi - IMM
Mechanical Properties
MEMS
Silicon Carbide (SiC)
Stress
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/235547
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