We have investigated 3C-SiC layers grown on silicon and on poly-Si in order to realize test MEMS structures. The residual strain of the films was investigated by the fabrication of cantilevers, beams, springs and we successfully fabricated a Double-Ended-Tuning-Fork double clamped SiC resonator on the film, with perfectly aligned actuation electrode.

Epitaxial growth, mechanical and electrical properties of SiC/Si and SiC/poly-Si

Bosi M;Attolini G;Watts BE;Roncaglia A;Poggi A;Mancarella F;Moscatelli F;Belsito L;Ferri M
2012

Abstract

We have investigated 3C-SiC layers grown on silicon and on poly-Si in order to realize test MEMS structures. The residual strain of the films was investigated by the fabrication of cantilevers, beams, springs and we successfully fabricated a Double-Ended-Tuning-Fork double clamped SiC resonator on the film, with perfectly aligned actuation electrode.
2012
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
Istituto per la Microelettronica e Microsistemi - IMM
Inglese
717-720
897
900
Sì, ma tipo non specificato
Mechanical Properties
MEMS
Silicon Carbide (SiC)
Stress
14th International Conference on Silicon Carbide and Related Materials (ICSCRM 2011) Location: Cleveland, OH Date: SEP 11-16, 2011 Sponsor(s): Cree; Keithley Instruments; AIXTRON; Dow Corn Elect Solut; Gen Elect; CuttingEdgeIons com; Off Naval Res; NASA Glenn Res Ctr; Infineon; SemiSouth; Microsemi; OAI
9
info:eu-repo/semantics/article
262
Bosi, M; Attolini, G; Watts, Be; Roncaglia, A; Poggi, A; Mancarella, F; Moscatelli, F; Belsito, L; Ferri, M
01 Contributo su Rivista::01.01 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/235547
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