The forward current-voltage (I-V) characteristics of Ni/Au Schottky contacts on AlGaN/GaN heterostructures have been studied in this work. The electrical characteristics exhibited a strongly non-ideal behavior that could not be described by the thermionic emission theory. Hence, we used a two diodes model, considering both the presence of the Ni/AlGaN barrier and of a second barrier height at the AlGaN/GaN heterojunction. Capacitance-voltage (C-V) measurements enabled us to experimentally determine the properties of the two dimensional electron gas (2DEG) and, hence, of the second barrier at the AlGaN/GaN interface. Following this approach, the anomalous I-V curves could be explained. Moreover, the value of the barrier height at zero-electric field (flat-band barrier height) was introduced and determined with this procedure, and resulted in a good agreement with literature data based on photoemission measurements. This approach provides a valid procedure for an accurate determination of the barrier height in AlGaN/GaN heterostructures, and the results can have useful implications for the fabrication of AlGaN/GaN HEMTs devices.

Temperature dependence of the I-V characteristics of Ni/Au Schottky contacts to AlGaN/GaN heterostructures grown on Si substrates

G Greco;S Di Franco;F Giannazzo;F Roccaforte
2017

Abstract

The forward current-voltage (I-V) characteristics of Ni/Au Schottky contacts on AlGaN/GaN heterostructures have been studied in this work. The electrical characteristics exhibited a strongly non-ideal behavior that could not be described by the thermionic emission theory. Hence, we used a two diodes model, considering both the presence of the Ni/AlGaN barrier and of a second barrier height at the AlGaN/GaN heterojunction. Capacitance-voltage (C-V) measurements enabled us to experimentally determine the properties of the two dimensional electron gas (2DEG) and, hence, of the second barrier at the AlGaN/GaN interface. Following this approach, the anomalous I-V curves could be explained. Moreover, the value of the barrier height at zero-electric field (flat-band barrier height) was introduced and determined with this procedure, and resulted in a good agreement with literature data based on photoemission measurements. This approach provides a valid procedure for an accurate determination of the barrier height in AlGaN/GaN heterostructures, and the results can have useful implications for the fabrication of AlGaN/GaN HEMTs devices.
2017
Istituto per la Microelettronica e Microsistemi - IMM
AlGaN
GaN
heterostructures
Schottky contacts
two-dimensional electron gas
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/356237
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