We present research carried out on molecular beam epitaxy grown InAs/(In)GaAs quantum dot structures for single- photon operation at long wavelengths. The optical and morphological properties of the structures are studied as functions of quantum dot growth parameters and of the InGaAs upper confining layer thickness and composition. We show that low growth rate, high growth temperature and reduced quantum dot coverage are very effective in reducing the quantum dot density but, owing to In desorption effects and quantum dot size reduction, this result is not always concomitant with the achievement of long wavelength emission. To this aim, we show that the use of InGaAs upper confining layers allows the redshift of quantum dot emission energy without affecting their density. Both the thickness and composition of the InGaAs layer have to be carefully chosen to provide a complete coverage of quantum dots and not to exceed the critical thickness for plastic relaxation. Our results led to the preparation of quantum dot structures with densities in the low 10(9) cm(-2) range, 1.33 mu m emission at 10 K and full widths at half maximum of 22 meV.

Low density InAs/(In)GaAs quantum dots emitting at long wavelengths

Trevisi G;Seravalli L;Frigeri P;Franchi S
2009

Abstract

We present research carried out on molecular beam epitaxy grown InAs/(In)GaAs quantum dot structures for single- photon operation at long wavelengths. The optical and morphological properties of the structures are studied as functions of quantum dot growth parameters and of the InGaAs upper confining layer thickness and composition. We show that low growth rate, high growth temperature and reduced quantum dot coverage are very effective in reducing the quantum dot density but, owing to In desorption effects and quantum dot size reduction, this result is not always concomitant with the achievement of long wavelength emission. To this aim, we show that the use of InGaAs upper confining layers allows the redshift of quantum dot emission energy without affecting their density. Both the thickness and composition of the InGaAs layer have to be carefully chosen to provide a complete coverage of quantum dots and not to exceed the critical thickness for plastic relaxation. Our results led to the preparation of quantum dot structures with densities in the low 10(9) cm(-2) range, 1.33 mu m emission at 10 K and full widths at half maximum of 22 meV.
2009
Istituto dei Materiali per l'Elettronica ed il Magnetismo - IMEM
semiconductor quantum dots
low quantum dot density
long wavelength emission
molecular beam epitaxy
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/41098
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 26
  • ???jsp.display-item.citation.isi??? ND
social impact