Conductive-atomic force microscopy is used to electrically characterize a nanometric metal-SiO2-Si (n(+)) system with Au nanocluster inclusions in SiO2. The system shows a marked rectifying behavior at room temperature with a threshold voltage function of the cluster size. This behavior is interpreted crossing physical considerations on metal-oxide-semiconductor structure and on double barrier tunnel junction device. The system fabricated and analyzed is proposed as a possible basic component for nanoelectronic circuits working at room temperature. (c) 2006 American Institute of Physics.

Nanoscale voltage tunable tunnel rectifier by gold nanostructures embedded in SiO2

Ruffino F;Giannazzo F;Roccaforte F;Raineri V
2006

Abstract

Conductive-atomic force microscopy is used to electrically characterize a nanometric metal-SiO2-Si (n(+)) system with Au nanocluster inclusions in SiO2. The system shows a marked rectifying behavior at room temperature with a threshold voltage function of the cluster size. This behavior is interpreted crossing physical considerations on metal-oxide-semiconductor structure and on double barrier tunnel junction device. The system fabricated and analyzed is proposed as a possible basic component for nanoelectronic circuits working at room temperature. (c) 2006 American Institute of Physics.
2006
Istituto per la Microelettronica e Microsistemi - IMM
INFM
COULOMB STAIRCASE
ELECTRON
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/455476
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