We demonstrated a 4H-SiC vertical Schottky diode for betavoltaic application using interdigit front metallization. A relevant increase in the betavoltaic short-circuit current with respect to a device with a continuous standard front electrode was achieved with this novel layout allowing to collect also low-energy electrons. In particular, by irradiating the device with a monochromatic electron beam (e-beam) of 17 keV, an internal gain that is 1.4 times higher than in conventional devices was obtained. An open-circuit voltage of similar to 1 V was obtained for an illumination e-beam current density of 10(-8) A/cm(2).

Interdigit 4H-SiC Vertical Schottky Diode for Betavoltaic Applications

Sciuto A;D'Arrigo G;Roccaforte F;Spinella RC;Raineri V
2011

Abstract

We demonstrated a 4H-SiC vertical Schottky diode for betavoltaic application using interdigit front metallization. A relevant increase in the betavoltaic short-circuit current with respect to a device with a continuous standard front electrode was achieved with this novel layout allowing to collect also low-energy electrons. In particular, by irradiating the device with a monochromatic electron beam (e-beam) of 17 keV, an internal gain that is 1.4 times higher than in conventional devices was obtained. An open-circuit voltage of similar to 1 V was obtained for an illumination e-beam current density of 10(-8) A/cm(2).
2011
Istituto per la Microelettronica e Microsistemi - IMM
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.14243/53684
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