ARMIGLIATO, ALDO
 Distribuzione geografica
Continente #
AS - Asia 10
EU - Europa 7
Totale 17
Nazione #
CN - Cina 4
SG - Singapore 4
FR - Francia 3
IT - Italia 3
KR - Corea 2
SE - Svezia 1
Totale 17
Città #
Guangzhou 3
Marseille 3
Lecce 2
Seoul 2
Singapore 2
Bologna 1
Totale 13
Nome #
DEPTH PROFILES AND DAMAGE ANNEALING OF 1.06-MEV AS-2+ IMPLANTED IN SILICON 3
GROWTH AND STRUCTURE OF TITANIUM SILICIDE PHASES FORMED BY THIN TI FILMS ON SI CRYSTALS 3
Microanalisi a Raggi X e microdiffrazione a fascio convergente: applicazioni al silicio 2
Damage and recovery in boron doped SOI layers after high energy implantation 1
Microanalisi a raggi X e microdiffrazione a fascio convergente:applicazioni al Silicio 1
Damage and recovery in doped SOI layers after high energy implantation 1
Effects of static disorder on LACBED patterns of single crystal silicon implanted with hydrogen 1
Damage and recovery in doped SOI layers after high energy implantation 1
Strain measurements in thin film structures by convergent beam electron diffraction 1
Damage and recovery in boron doped silicon on insulator layers after high energy Si+ implantation 1
MIcrochimica Acta: Proceedings of the 9th Workshop of European Microbean analysis Society (EMAS) and the 3rd Meeting og the International Union of Microbean Analysis Societies (IUMAS), Florence, Italy, may 22-26, 2005 1
Nitridation of the SiO(2)/SiC interface by N(+) implantation: Hall versus field effect mobility in n-channel planar 4H-SiC MOSFETs 1
Totale 17
Categoria #
all - tutte 802
article - articoli 553
book - libri 12
conference - conferenze 0
curatela - curatele 0
other - altro 0
patent - brevetti 0
selected - selezionate 0
volume - volumi 40
Totale 1.407


Totale Lug Ago Sett Ott Nov Dic Gen Feb Mar Apr Mag Giu
2023/202414 0 0 0 0 0 0 0 0 3 0 11 0
2024/20253 3 0 0 0 0 0 0 0 0 0 0 0
Totale 17